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  1. 101 Pillar 1 · Substrate Synthesis
  2. 102 Ingot
  3. 103 Wafering
  4. 104 FEOL
  5. 105 BEOL
  6. 106 Packaging

Silicon University / Pillar 01 · Substrate Material Synthesis & Bulk Crystal Engineering / Topic 1.2 · Chemical Purification & the Siemens Process

Tier 2 · Equipment & Kinematics 16 min read

Fractional Distillation Columns and Siemens CVD Reactor Dynamics

Details the design of fluidized bed reactors reacting MG-Si with HCl gas at 300^C to form Trichlorosilane (SiHCl_3), followed by multi-stage fractional distillation columns utilizing vapor-liquid equilibrium differences.

Chemical Process EngineersFacility EngineersFab Equipment Managers

01Fluidized Bed Hydrochlorination Tool Architecture

The initial chemical conversion of crude solid Metallurgical-Grade Silicon () into volatile trichlorosilane (, TCS) occurs in a high-pressure Fluidized Bed Reactor (FBR).

Process schematicSchematic · source diagram
Anhydrous HCl GasFine MG-Si PowderGaseous Products (TCS/STC/H2)FBR Freeboard DisengagementooFluidized Bed ooo (MG-Si Granules + HCl) ooo@ 300°C - 350°Co

Fluidization Kinematics

  1. Gas Distribution Grid: Anhydrous gas is pumped upward through a perforated bottom grid plate at velocities exceeding the minimum fluidization velocity ().
  2. Bed Behavior: Solid particles () become suspended in the upward gas stream, behaving like a bubbling liquid. This maximizes gas-solid contact area and maintains uniform thermal distribution ( at ).
  3. Exothermic Heat Extraction: The hydrochlorination reaction () is strongly exothermic (). Internal cooling coils circulate heat-transfer fluids to prevent thermal runaway above , which favors unwanted silicon tetrachloride (, STC) formation.

02Multi-Stage Distillation Train Hardware

To achieve the parts-per-trillion purity needed for 11N EGS, crude TCS liquid passes through a distillation train consisting of high-efficiency tray or packed columns operating under closed-loop nitrogen pressure:

Crude Tcs Feed ---> [ Light-Ends Column ] ---> [ Heavy-EndsSchematic · source diagram
Light-Ends ColumnHeavy-Ends ColumnCrude TCS FeedUltra-Pure TCS LiquidLow-Boilers (BCl3)Heavy Chlorides (Fe/Al/P)

Column Component Engineering

  • High-Theoretical-Plate Columns: Distillation towers utilize structured stainless steel packing (providing 50-100 theoretical plates per column) to separate chlorosilane species with close boiling points ( at vs at ).
  • Complexation Additives: To remove boron impurities (, boiling point ) whose volatility overlaps with TCS, Lewis base complexing agents (such as benzaldehyde or triphenylchloromethane) are injected. These agents bind selectively to , forming non-volatile adducts that drop to the column reboiler.
A dramatic photorealistic photograph inside a polysilicon manufacturing plant hall showing a row of massive Siemens CVD bell jar reactors
FIG. 1A dramatic photorealistic photograph inside a polysilicon manufacturing plant hall showing a row of massive Siemens CVD bell jar reactors

03Siemens CVD Bell Jar Reactor Mechanics

The heart of EGS production is the Siemens Bell Jar CVD Reactor, a high-current, water-cooled pressure vessel.

Process schematicSchematic · source diagram
TCS + H2 Gas InExhaust Gas OutWater-Cooled Steel Dome(150°C Wall)PolysilRods(1100°C)

Key Mechanical Subsystems

  1. Double-Walled Silver/Steel Bell Jar: A water-cooled outer dome keeps wall temperatures below , preventing gas-phase nucleation and undesirable silicon deposition on wall surfaces.
  2. Filament Power Control: Thin silicon seed filaments ( diameter, high) are arranged in inverted U-configurations. Direct AC Joule heating drives filament temperatures to .
  3. Power Scaling Electronics: As rod diameters expand from to , electrical resistance drops dramatically. High-power transformer arrays automatically adjust voltage (downward) and current (upward, reaching several thousand amperes per bridge) to maintain a constant surface temperature.
A detailed 2D engineering schematic cross-section of a Siemens Bell Jar CVD Reactor
FIG. 2A detailed 2D engineering schematic cross-section of a Siemens Bell Jar CVD Reactor

04Equipment Parameter Comparison Matrix

Operational ParameterFluidized Bed HydrochlorinatorSiemens CVD Bell Jar Reactor
Operating Temperature (Rod Surface)
Operating Pressure
Primary Chemical Inflow powder + Anhydrous gasPurified vapor + gas
Primary OutputCrude liquid TCS ()Solid High-Purity EGS Polysilicon Rods
Energy ConsumptionLow ()High ()
An industrial tool architecture diagram titled 'Fluidized Bed Reactor vs Siemens CVD Reactor'
FIG. 3An industrial tool architecture diagram titled 'Fluidized Bed Reactor vs Siemens CVD Reactor'

→Prerequisites & continue reading

Prerequisites: Understanding of TCS synthesis and Siemens process fundamentals

Also in Topic 1.2, Chemical Purification & the Siemens Process:

Tier 1 · Achieving 11N Purity: Trichlorosilane and the Siemen…Tier 3 · CVD Deposition Kinetics and Mass-Transfer Dynamics i…