Silicon University / Track A / Pillar 04 · Wet Processing
12
Particle Removal & Zeta Potential Engineering
Step 12 of 24 · Surface Chemistry, Ultra-Clean Wet Processing & Contamination Control · three tiers, 62 min total.
FEOL phase
Topic 4.3
3 articles
Tier 1 · Core FundamentalsParticle Removal Physics & Zeta Potential Manipulation
Explains why nano-particles stick to wafer surfaces due to electrostatic charge, and how controlled chemical pH combined with Isopropyl Alcohol (IPA) Marangoni drying pre…
Tier 2 · Equipment & KinematicsMegasonic Transducer Kinematics & Marangoni Drying Mechanics
Structural engineering of piezoelectric megasonic transducers (800kHz - 1.2MHz), acoustic energy distribution plates, vapor-phase IPA drying hood mechanics, and high-pres…
Tier 3 · Deep-Dive & Yield EngineeringDLVO Theory, Acoustic Cavitation Dynamics & Supercritical CO2 Drying Physics
Quantitative analysis of van der Waals (V_VDW) vs. Electrostatic Double Layer (V_EDL) interaction energy, Zeta potential (ζ) tuning across pH scales, stable acoustic micr…