Silicon University / Track A / Pillar 05 · Photolithography
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DUV Immersion Lithography (193i)
Step 13 of 24 · Advanced Photolithography & Computational Optics · three tiers, 52 min total.
FEOL phase
Topic 5.1
3 articles
Tier 1 · Core FundamentalsDUV Immersion Lithography (193i): Fundamentals of High-NA Fluidic Patterning
Introduces optical lithography basics, explaining how light passes through a photomask and reduction lens to project circuit patterns onto light-sensitive photoresist fil…
Tier 2 · Equipment & KinematicsDUV Scanner Optics & Water Immersion Hood Mechanics
Technical specification of dual-stage DUV immersion scanners (1.35NA), magnetic levitation stage acceleration (10+G), immersion liquid confinement head design, and lens h…
Tier 3 · Deep-Dive & Yield EngineeringHyper-NA Fluid Dynamics, Polarization Effects & Line-Edge Roughness Physics
Deep analysis of Rayleigh criteria (R = k_1 λNA), polarization effects at high numerical apertures, water bubble entrainment fluid dynamics, refractive index matching, an…