Silicon University / Track A / Pillar 05 · Photolithography
14
EUV & High-NA EUV Lithography
Step 14 of 24 · Advanced Photolithography & Computational Optics · three tiers, 58 min total.
FEOL phase
Topic 5.2
3 articles
Tier 1 · Core FundamentalsExtreme Ultraviolet (EUV) Lithography: Fundamentals of 0.33 NA & 0.55 High-NA Systems
Explains the revolutionary shift from refractive lenses to reflective mirror optics using 13.5nm Extreme Ultraviolet light, generated by shooting high-power lasers at tin…
Tier 2 · Equipment & KinematicsEUV Tin Plasma Source & Anamorphic Mirror System Mechanics
Detailed hardware breakdown of CO_2 laser-produced plasma (LPP) droplet generators (50,000 droplets/sec), Mo/Si multilayer reflective optics, anamorphic lens magnificatio…
Tier 3 · Deep-Dive & Yield EngineeringHigh-NA Anamorphic Optics, Mask 3D Effects & EUV Flare Physics
Physics of EUV photon scarcity, Poisson photon shot noise statistics, line-edge roughness (LER) / line-width roughness (LWR) formation, non-telecentric 3D mask absorber s…